PULSED ELECTRON BEAM SOURCE (VERSIONS) Russian patent published in 2010 - IPC H01J37/65 

Abstract RU 2395866 C1

FIELD: physics.

SUBSTANCE: proposed device comprises HV insulator, multi-blade inflammable cathode representing a cathode substrate supporting stabilising resistors with edges, focusing electrode connected with cathode substrate via resistor, anode electrode secured on anode flange, control screen, target, beam shaping magnetic system arranged outside aforesaid source. Source comprises also stabilising screen at potential of focusing electrode, and discharge electrode representing a metal plate with orifices and arranged nearby apices of said edges and supplied from resistance-capacitance divider connected to pulsed voltage generator. Note that magnetic field is used to produce required shape of electron beam. Electrostatic focusing by focusing electrode and anode electrode are also used for shaping electron beams.

EFFECT: uniform distribution of current density over beam cross section, control over beam current irrespective of external electric field.

10 cl, 2 dwg

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RU 2 395 866 C1

Authors

Ehngel'Ko Vladimir Ivanovich

Tkachenko Konstantin Ivanovich

Mjuller Georg

Dates

2010-07-27Published

2009-06-11Filed