FIELD: process engineering.
SUBSTANCE: claimed method can be used for surface-hardening of cutting edges of tools, particularly, surgical tools, and coating of field-emission cathode blade surfaces. Proposed method comprises the steps that follow. Generation of gas-discharge plasma and HV emission of sputtering ions from plasma. Graphite target is sprayed by accelerated ions of plasma-forming inert gas to obtain carbon vapours. Carbon vapours and ions are condensed on substrate that contacts with gas-discharge plasma. Carbon vapour flow is forced in cathode and anode chambers via bore in hollow cathode bottom towards the flow of ionizing ions accelerated to 10 kV to ionize them at discharge with hollow cathode. Portion of carbon vapour flow is released via emission channel in reflection cathode in one direction with the flow of formed carbon ions and those of plasma-forming inert gas. Carbon vapours and ions are deposited at direct control effects of plasma-forming ions of inert gas with energy of 0.12 keV. Claimed device comprises graphite target, hollow and reflecting cathodes, cylindrical anode, magnetic system, inert plasma-forming gas feed system, power supplies and substrate. Cylindrical hollow cathode end walls have two axial aligned bores. Graphite target isolated from hollow cathode is fitted in one bore at said bottom at high negative electric potential. Another bore communicates cathode and anode chambers. Reflecting cathode has axial emission channel with substrate at its periphery at negative electric potential. Carbon vapours, carbon ions and plasma-forming argon gas ions are directed thereto.
EFFECT: reliable protection of substrates, higher hardness, low friction and high emissive capacity.
2 cl, 4 dwg, 1 ex
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Authors
Dates
2015-11-10—Published
2013-08-06—Filed