FIELD: chemical processes.
SUBSTANCE: invention relates to a class of roll reactors for chemical deposition of thin graphene films from the gas phase. In order to continuously synthesise graphene, a roll-type CVD reactor is used, including a vacuum working chamber with a heat-insulated heating area, one or several, a system of temperature controllers, a substrate moving system, a gas supply system, and a vacuum pumping system. The heat-insulated heating area and the system for moving the strip substrate are located inside the vacuum chamber, thus preventing the contact of the metal substrate with the graphene layer applied thereon with the atmosphere until complete cooling.
EFFECT: creation of a compact apparatus for synthesising high-quality coatings on substrates in the form of a wide strip.
4 cl, 4 dwg
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RU2784523C2 |
