FIELD: chemistry.
SUBSTANCE: invention relates to a method and a device for producing a nanomaterial: a graphene film. Method of obtaining is based on formation of graphene film on layer of metal catalyst in vacuum chamber of plasma-chemical microwave, heating of substrate in current plasma-forming gas to decomposition temperature of inflated hydrocarbon gas on said catalyst. Method is characterized by that substrate in vacuum chamber is oriented catalytic surface downwards with provision of plasma contact with its non-catalytic surface. Between the catalytic surface of the substrate and the table, a closed cavity is formed, which is limited by the table, the catalytic surface of the substrate and a gas-permeable plasma shield enveloping it. Also disclosed is a device for producing a graphene film according to the above method.
EFFECT: high quality of the obtained graphene film due to its homogeneity.
4 cl, 4 dwg, 2 ex
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