FIELD: microwave and plasma technology.
SUBSTANCE: invention relates to the field of microwave and plasma technology and can be used to deposit metal particles using a microwave discharge on ceramic carriers to obtain catalysts. The method for plasma-chemical deposition of metal nanoparticles on the surface of a dielectric ceramic powder using a microwave discharge includes the following operations. The impact of pulsed microwave radiation with a power of 200-400 kW with a pulse duration of 4⋅10-3-8⋅10-3 s on a mixture of metal powder and dielectric ceramic powder is carried out. The absorption of microwave radiation energy of 0.3-3 J/g by a mixture of metal powder and dielectric ceramic powder, initiation of a microwave discharge in a mixture of metal powder and dielectric ceramic powder, evaporation of metal from the surface of metal powder particles and deposition of formed metal nanoparticles with sizes not exceeding 20 nm to the surface of dielectric ceramic powder particles.
EFFECT: invention provides deposition of metal particles on the surface of ceramic carriers with increased accuracy in terms of particle sizes and their narrow size distribution.
7 cl, 5 dwg, 4 ex
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