DEVICE FOR ELECTRON BEAM LITHOGRAPHY Russian patent published in 2023 - IPC H01J37/304 G03F7/20 

FIELD: microelectronics.

SUBSTANCE: invention relates to equipment for creating microelectronics devices using electron beam lithography technology. A device for electron beam lithography (dwg 1) contains: an electron-optical system 1 with an electron beam intensity control unit 2; a coordinate table 3 with an electric drive 4 and a control unit for the current position of the mobile platform 5; a control computer 6; an image generator 7; a coordinate table driver 8; the image generator driver 9, while the inputs for controlling the parameters of the electron beam of the electron-optical system 1 are connected to the corresponding outputs of the image generator 7, the input of which is connected to the output of the electron beam intensity control unit 2, and the data exchange port is connected via a fiber-optic communication line through the image generator driver 9 to the control computer 6, which with its other data exchange port via the coordinate table driver 8 is connected to the electric drive of the coordinate table drive 4 and the control unit for the current position of the mobile platform 5.

EFFECT: invention provides a reduction in the total time for the manufacture of a finished product by electron beam lithography while increasing the noise immunity of the equipment used.

1 cl, 3 dwg