METHOD FOR PRODUCING PHOTOCATALYTIC TITANIUM OXIDE FILMS AND DEVICE FOR ITS IMPLEMENTATION Russian patent published in 2023 - IPC C23C14/35 C23C14/56 

FIELD: manufacturing thin films in a vacuum.

SUBSTANCE: invention is intended for the formation of photocatalytic films of titanium oxide (TiO₂) and also discloses a magnetron sputtering unit for implementing said method. A glass substrate 2–8 mm thick is washed in an ultrasonic bath with distilled water, then cleaned in ethanol vapor. The washed substrate is placed on the upper face of a hollow cylinder forming a quasi-closed volume, and the vacuum is pumped out to values not higher than 5⋅10^-3 Pa. A working mixture of 70% argon and 30% oxygen gases is pumped into the quasi-closed volume of the hollow cylinder. A pulsed voltage is applied to the titanium target, while the magnetron discharge current is 1±0.1 A. Then, a thin titanium oxide film 100±20 nm thick is formed on the substrate by pulsed reactive magnetron sputtering.

EFFECT: increased photocatalytic activity of the film TiO₂.

2 cl, 1 dwg, 1 tbl