METHOD FOR OBTAINING MOLYBDENUM-DOPED TITANIUM DIOXIDE NANOFILMS USING ATOMIC LAYER DEPOSITION Russian patent published in 2023 - IPC C01G23/47 B32B33/00 B82Y30/00 B82Y40/00 B01J21/06 B01J23/28 B01J37/25 

FIELD: solar energy.

SUBSTANCE: manufacture of photocatalysts for the decomposition of water and organic pollutants, as well as antibacterial nanocoatings. Metal-doped titanium dioxide nanofilms are obtained by atomic layer deposition (ALD). A silicon substrate is used, on which Al₂O₃ is deposited as a seed oxide layer by the ALD method by alternately supplying trimethylaluminum (TMA) vapor and water to the reaction zone with nitrogen purge after the vapors of each of these reagents are puffed. Titanium tetrachloride is used as the precursor of titanium atoms, water is used as the precursor of oxygen atoms, and MoOCl ₄ is used as the alloying metal compound. The reagents during ALD are fed cyclically in the following mode: the first subcycle is TiCl₄-H₂O, for which TiCl₄ vapors are puffed for 1 s, purged for 30 s, H₂O vapors are puffed for 1 s and again purged for 30 s; the second subcycle is MoOCl₄-H₂O, for which MoOCl₄ vapors are puffed in for 1 s, purged for 30 s, H₂O vapors are puffed in for 1 s and again purged for 30 s. All ALD processes are carried out at a reaction zone temperature of 160°C. Supercycles consisting of the indicated subcycles are repeated until the required film thickness is obtained. To increase the relative content of molybdenum atoms in the resulting film, the numerical ratio of these subcycles is changed.

EFFECT: obtaining uniform films, control of their thickness and composition, ensuring their conformity and high adhesion on substrate surfaces with complex topography.

2 cl, 3 dwg