METHOD FOR OBTAINING A FUNCTIONALIZED NANOSTRUCTURE BASED ON POROUS SILICON Russian patent published in 2023 - IPC C30B31/04 C30B33/10 B01J16/00 B82Y30/00 B82Y40/00 H01L21/288 

FIELD: chemical industry.

SUBSTANCE: methods for the synthesis of composite nanostructures, and in particular methods for manufacturing porous functionalized layers made on the surface of single-crystal silicon. The invention can be used in the manufacture of optical communication systems, light guides, optical resonant sensors, filters in the optical and near ultraviolet band, substrates for analysis by surface Raman scattering. First, a porous silicon substrate is obtained, the surface layer is removed mechanically, either by chemical etching, or using focused ion beam method, after which the substrate is kept in a solution of monohydric alcohol, for example, isopropanol, methanol or ethanol. Then the substrate is functionalized by immersing it in a solution of fullerenols doped with the required functionalizing elements, obtained by dispersing the indicated fullerenols in distilled water. The desired functionalizing elements are selected from metals and/or non-metals. Then, the substrate is held in this solution either statically or dynamically, for example, by centrifugation. After holding the substrate, it is removed from the solution and dried.

EFFECT: obtaining a functionalized nanostructure based on porous silicon with an increased penetration depth of the functionalizing element into the porous silicon layer and to ensure uniform coverage of the functionalizing element both over the surface and in the depth of the porous layer.

5 cl, 7 dwg, 2 ex