METHOD OF PRODUCING SENSITIVE TO GIANT RAMAN SCATTERING SUBSTRATES BASED ON POROUS SILICON, CONTAINING SILVER NANOPARTICLES Russian patent published in 2019 - IPC H01L21/265 B82Y40/00 

FIELD: optics.

SUBSTANCE: invention relates to optics and specifically to methods of making devices for analyzing chemical substances using the effect of surface-enhanced Raman light scattering by molecules located near silver nanostructures exhibiting plasmon resonance of conduction electrons whose oscillations generate a local electromagnetic field. These devices are designed to determine low concentrations of organic matter when excited by a laser beam in the visible range and are based on substrates of porous silicon with surface nanostructures of silver. Method of making substrates with surface of porous silicon which are sensitive to giant Raman scattering involves forming a given structure on the surface of the initial monocrystalline silicon plate by implantation with silver ions with energy of 4–120 keV, radiation dose, providing concentration of the introduced metal atoms in the irradiated silicon layer 1.0⋅10¹⁹–6.5⋅10²³ atoms/cm³, and current density of ion beam 2⋅10¹²–1⋅10¹⁴ ion/cm²sec.

EFFECT: enabling production of substrates having a surface of porous silicon which contains silver nanoparticles not chemically and per one process cycle in a vacuum, which are sensitive to giant Raman scattering.

1 cl, 10 dwg