FIELD: optical instrumentation.
SUBSTANCE: ellipsometric sensor comprises a radiation source, a compensator, a polarizer, an object under study, two analysers, two photodetectors that record two beams that have passed through the analysers. In addition, it includes a two-beam collimator located between the radiation source and the compensator, which forms two parallel beams, and an adjustable system of mirrors located between the polarizer and the object under study, which sets the angle of incidence of the rays on the object under study.
EFFECT: possibility of measuring the thickness of a transparent film on a transparent substrate with a non-zero curvature of the surface.
1 cl, 4 dwg
