METHOD FOR PURIFICATION OF WASTEWATER AFTER PRODUCTION OF PRINTED CIRCUIT BOARDS CONTAINING PHOTORESISTOR SPF-VSCH AND DEVICE FOR ITS IMPLEMENTATION Russian patent published in 2023 - IPC C02F1/465 C02F1/28 C02F1/66 C02F9/00 

FIELD: treating wastewater.

SUBSTANCE: invention is related to treatment of wastewater left after production of printed circuit boards containing an “СПФ-ВЩ” photoresistor, and a device for its implementation. The method consists in treating wastewater containing “СПФ-ВЩ” photoresistor with sulfuric acid to pH 2-4. Next the following is introduced in sequence: activated carbon “БАУ-А” at a mass ratio of the photoresistor “СПФ-ВЩ” content to the introduced reagent 1:[0.3-0.5], organic flocculant polyacrylamide granulated sulphate “ПАА-ГС” at a mass ratio of the photoresistor “СПФ-ВЩ” to the introduced flocculant at base substance 1:[0.002-0.003], followed by electroflotation extraction of the dispersed phase of the photoresistor “СПФ-ВЩ”. The wastewater treatment device contains a housing divided into a preliminary water treatment section in the form of a mixing reactor and an electroflotation treatment section. The preliminary water treatment section is equipped with a pipe for introducing waste water, a centrifugal pump, a “БАУ-А” dispenser, sulfuric acid and organic flocculant. The electroflotation cleaning section is divided by a transverse partition into two equal independent sections, each of which contains a set of insoluble horizontal comb electrodes, and is equipped with a pipe for removing the purified waste, a foam collector and a foam collection device, controlled by a drive. The ratio of volume of the preliminary water treatment section and the electroflotation treatment section is 1:3.

EFFECT: increasing the degree of extraction of the photoresistor “СПФ-ВЩ” both in form of a dissolved phase and in form of a dispersed phase.

2 cl, 1 dwg, 2 tbl, 3 ex