METHOD FOR PRODUCING ALUMINUM-MOLYBDENUM OXIDE NANOFILMS BY ANHYDROUS ATOMIC LAYER DEPOSITION METHOD Russian patent published in 2023 - IPC C23C16/44 B82Y40/00 

FIELD: industrial chemistry.

SUBSTANCE: method for producing aluminum-molybdenum oxide nanofilms by thermal anhydrous atomic layer deposition (ALD). The invention consists of a two-stage process, where the first stage prepares the surface for deposition by applying aluminum oxide in a thickness 60 Å using trimethylaluminum and water by atomic layer deposition to create a large number of hydroxyl groups on the surface and ensure high adhesive strength of the aluminum-molybdenum oxide nanofilm to the substrate. At the second stage, anhydrous atomic layer deposition of aluminum-molybdenum oxide nanofilm is carried out using an ALD cycle consisting of a cyclic sequential injection of trimethylaluminum vapor and molybdenum dioxide VI chloride. Film growth is carried out in stages due to chemical self-limiting surface reactions of the reagents used; ALD cycles are repeated until the required nanofilm thickness is achieved.

EFFECT: advantage of process reproducibility, control of film composition, and layer-by-layer control of the thickness of the resulting film at the nanometer level; the atomic layer deposition method provides a high degree of adhesion and conformity, both on flat substrates and surfaces, and on substrates and surfaces with complex topography.

1 cl, 3 dwg