FIELD: semiconductor electronics.
SUBSTANCE: used when applying galvanic coatings to the housings of semiconductor devices. The method includes chemical or galvanic deposition of nickel, galvanic deposition of gold, final rinsing in distilled or deionized water and drying; after rinsing and drying, the housings are sharply heated for 3-6 seconds to a temperature of 300-350 °C, and after cooling the cases, additional final rinsing and drying is carried out.
EFFECT: removal of electrolyte and salts hidden in microcavities from the surface of the coating, which can lead to corrosion of the metal pads of the crystal, aluminium mounting conductors, etc., of a mounted device in a gold-plated housing.
1 cl, 2 tbl, 1 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF MAKING PHOTOCONVERTER CONTACTS | 2007 |
|
RU2357326C1 |
| METHOD FOR PRODUCING MAGNETOELECTRIC STRUCTURES | 2017 |
|
RU2682504C1 |
| METHOD OF MANUFACTURING METAL-POLYMER HOUSING OF MICROCIRCUIT | 2023 |
|
RU2821166C1 |
| METHOD FOR MANUFACTURING A HEAT SINK OF A SEMICONDUCTOR DEVICE BASED ON CVD DIAMOND | 2022 |
|
RU2793751C1 |
| SEMICONDUCTOR CHIP MANUFACTURING PROCESS | 1992 |
|
RU2012095C1 |
| METHOD OF FORMING LIGHT-ABSORBING COATING | 2014 |
|
RU2570715C2 |
| SEMICONDUCTOR CHIP MANUFACTURING PROCESS | 1992 |
|
RU2012094C1 |
| FABRICATION OF IC CASE | 2013 |
|
RU2561240C2 |
| PROCESS OF DEPOSITION OF METAL COATS ON ARTICLES MADE OF MAGNESIUM AND ITS ALLOYS | 1999 |
|
RU2150534C1 |
| PROCESS OF MANUFACTURE OF SEMICONDUCTOR CRYSTALS | 1992 |
|
RU2035085C1 |
