FIELD: chemistry.
SUBSTANCE: present invention relates to polymers based on urethane or urea, blocked with acrylate end groups, as well as to use of said polymers for further processing using multiple types of technologies, such as 2-photon polymerisation, stereolithography (SLA-printing), electrospinning, film casting, leaching of pore-forming agents, extrusion-based 3D printing, drying by means of spraying, cryogenic treatment, coatings, cross-linkable micelles, coating by centrifugation and electrospray. Said polymer is a compound of formula: X1 - Y1 - Z1 - main circuit - Z2 -Y2 - X2, in which X1 and X2 independently represent a moiety containing one or more (meth)acrylate groups, wherein the sum of the (meth) acrylate groups in X1 and X2 is at least 3, Y1 and Y2 independently represent a direct bond or a spacer, where the spacer is selected from ethylene oxide (EO), propylene oxide (PO), oligoesters and combinations, Z1 and Z2 independently represent a moiety containing urethane and/or urea, and the backbone chain is a polyether. Molecular weight of the urethane or urea-based polymer is at least 5000 Da.
EFFECT: physical properties of the obtained structures can be fine-tuned by changing the composite blocks of resins and taking into account their biodegradability, biocompatibility, good kinetics and shape accuracy, compounds of the present invention enable their use in multiple types of technologies, in particular, the presence of several photoreactive groups, optionally in combination with flexible spacers, provides fast cross-linking and processing at high write speeds (>20000 mcm s-1) while maintaining excellent imitation of CAD-CAM and shape accuracy.
7 cl, 10 dwg, 1 tbl, 7 ex
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Authors
Dates
2024-04-22—Published
2019-11-05—Filed