METHOD OF MAKING THREE-DIMENSIONAL STRUCTURES FROM CLOSE-PACKED SPHERICAL AMORPHOUS SILICON DIOXIDE PARTICLES Russian patent published in 2024 - IPC C01B33/12 C01B33/18 C04B35/14 

FIELD: various technological processes.

SUBSTANCE: invention can be used in colloidal chemistry, photonics, biotechnology and medicine. Method of making volumetric structures from close-packed spherical amorphous silicon dioxide particles involves sedimentation of amorphous SiO₂ spheres in an aqueous suspension. Sedimentation process is carried out with evaporation of water in the temperature range of 60–75 °C preliminary concentration of suspension in the range of concentrations of 20–40 wt.%. Then the temperature is raised to 110–130 °C, held for 10–12 hours and annealed at temperature of 600 °C in air for 4–6 hours.

EFFECT: invention increases the rate of formation of close-packed structures during sedimentation of amorphous spherical SiO₂ particles in an aqueous medium.

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