METHOD OF MEASURING CAPACITANCE OF MIS STRUCTURE Russian patent published in 2024 - IPC G01R31/26 G01R27/26 

FIELD: measuring equipment.

SUBSTANCE: method of measuring capacitance of a MIS structure is based on using time-pulse reflectometry, which consists in analysing parameters of reflected and transmitted signals when pulses with a short rise time are applied to the object under investigation. At the same time, two transmission lines are used, between which the MIS structure is connected, the lines are shifted by constant voltages, pulses with rise time of not more than 20 ps are supplied to the line, forms of reflected and through signals are determined for calculation of MIS structure capacitance.

EFFECT: invention provides higher accuracy of measuring capacitance by eliminating the effect of parasitic elements, such as series resistance, inductance and capacitance to ground, as well as reduction of measurement cycle time due to exclusion of preparatory procedures associated with determination of any reference values.

1 cl, 5 dwg, 1 tbl