FIELD: measuring.
SUBSTANCE: invention relates to measurement equipment and is intended for the formation of a given number of discrete increments of resistance relative to the nominal resistance of the simulated resistance strain gauge during metrological studies, calibration and verification of high-speed measuring systems in automatic mode. Nominal resistance of the simulated resistance strain gauge Rn and the range of resistance increment ±ΔR are selected. Ratio is selected, which is used to calculate the possible number of steps of resistance increment k1=m×n. Outputs of circuits of m-1 and n-1 resistors are connected in series through key elements of commutators to their outputs; voltages proportional to increments of resistances of simulator stages with pitch R1 are formed at their outputs. Required number of steps of resistance increment k2, which is formed by the simulator, is additionally determined. Values m and n are selected so that value k1 is maximally close to value k2. Determining from the ratio a=k1-k2, by how many stages the simulator can form compared to the required number, wherein the number of required maximum negative and maximum positive stages will be less by a/2 in relation to the value of the same stages k1. Value of resistance of the reference resistor is calculated from the ratio R0=Rn-ΔR-(a/2)×R1, where R1=(2×ΔR)/(k2-1), value of resistance of the resistor circuit of n-1 resistors from the ratio R2=m×R1. Output 1+a/2 is connected to switch K1, and output m+1 to switch K2, wherein at outputs of switches generated is voltage equal to I×(Rn-ΔR), which corresponds to voltage of minimum resistance of maximum negative stage of simulator. To form the following stages, outputs of circuits of m-1 resistors and n-1 resistors are connected in series to switch K1. Formation of resistance increment steps is completed after m+n output is connected to switch K2 input, and that output of circuit of m-1 resistors is connected to input of switch K1, which provides formation of maximum positive of k2 step of resistance increment of simulator. At that, at outputs of switches K1 and K2 voltage equal to I×(Rn+ΔR) is generated.
EFFECT: broader functional capabilities of the resistance increment steps shaper in the strain gage signals simulator, designed to generate m×n steps of increment of resistance to provide formation of any number of steps of resistance increment with minimum total number of resistors of chains of m-1 resistors and n-1 resistors.
1 cl, 3 dwg
Authors
Dates
2024-11-13—Published
2024-08-05—Filed