HIGH-FREQUENCY ELECTRODE FOR HIGH-FREQUENCY ARC PLASMATRON Russian patent published in 2025 - IPC H05H1/34 

FIELD: obtaining plasma; plasma control.

SUBSTANCE: invention relates to devices for producing and controlling plasma when heating gas jets in plasma-chemical, metallurgical and other processes. In an electrode consisting of a gas flow former and a tungsten tip holder, gas flow former is a central coaxial channel for supply of plasma-forming gas to the plasmatron, having a cooler with water cooling. At the beginning of the gas flow generator there is an inner conical surface, which plays the role of a radiator for heat removal by a liquid coolant. Outer surface of the gas flow former has a polished surface, which allows the former to move in the holder with preservation of the plasmatron tightness. Holder of tungsten tip is made of copper in the form of collet clamp, which provides tight mechanical and thermal contact between tungsten tip, on which gas discharge is stabilized, and conical surface of gas flow former. Holder design also provides the function of the nozzle due to the gas channels available in it.

EFFECT: longer service life of the plasmatron, higher thermal efficiency, ease of discharge ignition, possibility of working with chemically aggressive gases.

1 cl, 1 dwg