FIELD: chemistry.
SUBSTANCE: proposed invention relates to enrichment – purification from chemical impurities of quartz material, in particular to enrichment of quartz particles with size of 0.075÷0.4 mm, and can be used for dressing of granular minerals. Method for continuous enrichment of quartz raw material is characterized by that the non-magnetic fraction of quartz particles is processed in the working volume of the plasma reactor at vacuum rarefaction of 100-0.1 Pa, after supply of working gas of halide – hydrogen chloride with additives of plasma-forming gases – argon or helium and hydrogen – plasma induction flat high-frequency discharge is excited. When stable combustion of plasma is achieved through feeders, quartz raw material is dosed with formation of a layer of raw material in the reactor and simultaneous excitation by reciprocating horizontal movement of the plasma reactor. Directed movement of quartz raw material is provided with rolling of grains of raw material along the surface of the reactor with mixing in the layer in the direction of the receiving hopper. When entering the receiving bin, the treated quartz material is passed through a coaxial plasma induction discharge in an atmosphere of a mixture of hydrogen with argon or helium, where a fine non-working fraction and amorphous silica are cut off. For localization of plasma burning above the processed raw material the grounded electrode is placed outside the reactor above the inductor.
EFFECT: increasing the level of enrichment of quartz raw material, which meets industrial demand, while simultaneously reducing power consumption, improving environmental friendliness and increasing efficiency of the enrichment method by plasma treatment of quartz raw material.
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Authors
Dates
2025-03-14—Published
2023-12-20—Filed