FIELD: plasma technology.
SUBSTANCE: gridless ion source comprises a magnet, an external polar magnetic element connected to the magnet through a magnetic conductor, an anode located between the polar magnetic element and the magnet, a base and a reflector located between the magnet and the anode, wherein in base there is through central threaded hole, and the reflector is replaceable and comprises a rod part of the reflector made in such a way that it is possible to attach the rod part of the reflector to the base through the central threaded hole by means of a detachable threaded connection or through insulators.
EFFECT: broader functional capabilities of a gridless ion source.
1 cl, 3 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| ION SOURCE ( VARIANTS ) | 2001 |
|
RU2187218C1 |
| PLASMA ION SOURCE | 2008 |
|
RU2371803C1 |
| DEVICE FOR HIGH-SPEED MAGNETRON SPUTTERING | 2006 |
|
RU2311492C1 |
| PLASMA PRODUCTION AND ACCELERATION PROCESS AND PLASMA ACCELERATOR WITH CLOSED-CIRCUIT ELECTRON DRIFT IMPLEMENTING IT | 1999 |
|
RU2156555C1 |
| PLASMA ION SOURCE AND ITS OPERATING PROCESS | 2000 |
|
RU2167466C1 |
| MAGNETRON SPRAYING DEVICE | 1992 |
|
RU2032766C1 |
| HIGH-SENSITIVE IONIZATION VACUUM-GAUGE TRANSDUCER | 2017 |
|
RU2682067C2 |
| PLASMA ELECTRON SOURCE | 2002 |
|
RU2208871C1 |
| ION SPUTTERING DEVICE (VERSIONS) | 2014 |
|
RU2595266C2 |
| ION SOURCE | 1990 |
|
RU1766201C |
