METHOD OF DETERMINATION OF QUANTITIES OF ALKYLPHENOLFORMALDEHYDEALKALI-SOLUBLE RESINS IN CONTENT OF POLYMER BASE OF PHOTORESISTS Russian patent published in 1995 - IPC

FIELD: analytic chemistry. SUBSTANCE: analysis is conducted by determination of rate of dissolution of resin layer on substrate in aqueous-alkaline solution of developer with calculated content of each resin by formulas C₁= [(lgV-lgV₂):(lgV₁-lgV₂)]·100% C₂= 100-C₁, where V is rate of dissolution of layer of polymer base in aqueous-alkaline solution of developer; V₁ and V₂ are rates of dissolution of layer of first and second resins in aqueous-alkaline solution of developer and correspondingly C₁ and C₂ are percentages of first and second resins in composition of polymer base with V₁< V < V₂. These conditions decrease time of process from 16.57 to 5.53 h with keeping of reproducibility of phototechnical parameters of photoresist when resins of different lots are used. EFFECT: decreased development time. 2 tbl