FIELD: electronics. SUBSTANCE: first layer of positive photoresistors is deposited on substrate, is dried and exposed without mask. Then second layer of positive photoresistor is deposited, is dried and exposed through mask and pattern is developed in two-layer film. Value t1 of exposure of first layer of photoresistor is chosen equal to 2 t2, where t2 is value of exposure of second layer of photoresistors within range of exposure latitude. EFFECT: improved efficiency of process. 1 tbl
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