METHOD FOR PREPARATION OF SURFACE OF SUBSTRATE BEFORE APPLICATION OF PHOTORESIST Russian patent published in 1995 - IPC

FIELD: radio engineering. SUBSTANCE: method involves processing the substrate before application of photoresist by 0,01-1 percent water- based solution of cation-active surface-active substance of catalytic amine of alkyl-benzyl-dimethyl-ammonium chloride having general formula [C_nH_2n+1N⁺(CH₃)₂CH₂C₆H₅]Cl^-, where n=10-18. This results in possibility to increase adhesion of photoresist to substrate due to generation of additional monolayer of catalytic amine which is removed during subsequent development. EFFECT: increased good-to-bad ratio due to decreased number of flaws in photoresist layer and excluded step of reconstruction.