EVAPORATOR Russian patent published in 1996 - IPC

FIELD: microelectronics. SUBSTANCE: invention refers to deposition of resist by spraying in vacuum. Evaporator includes resist dosage meter 3 put coaxially in melting pot 2, additional screen 11 with holes 14, 15 anchored on to screen 9 between former 10 of steam flow and dosage meter 3 and rest 16 with central hole 17. Dosage meter is manufactured in the form of cylindrical tube 4 with through lateral grooves 15 arranged in one row and resist separator 6 fabricated in the form of rod 6 with longitudinal flat 7 and circular lateral grooves 8 which is mounted uniaxially inside tube 4 for reciprocating motion. With this lateral grooves 5 of tube 4 are placed between lateral grooves 8 of rod 6 and additional screen 11 is made in the form of two discs 12, 13 with holes 14, 15 displaced relative to each other. Rest 16 interacting with separator 6 is produced in the form of sleeve with through holes 18 in its side surface. Tube 4 of dosage meter 3 is manufactured from thermal material, for instance fluoroplastic. Proposed design of evaporator makes it possible to conduct dosed evaporation of resist by portions. EFFECT: reduced usage of resist. 6 cl, 1 dwg