METHOD FOR APPLICATION OF COATINGS IN VACUUM AND VACUUM PLANT EVAPORATOR FOR ITS EMBODIMENT Russian patent published in 1996 - IPC

FIELD: vacuum and gas-discharge electronics, particular, technology of application of thin films, applicable in growing of epitaxial layers in vacuum for modification of various coatings in the process of their growing and for application of thin films. SUBSTANCE: after evaporation, pores are formed in a row of molecular flows overlapping one another. Pores of substances having complex compounds simultaneously with formation into a row of molecular flows dissociate into components. Introduced coaxially into evaporator of vacuum plant at the outlet of crucible 1 is former 3 of molecular flows in form of metal cylinder accommodating tubes 7 parallel to its longitudinal axis and presenting a thermal tube 8. Former 3 has heater 9. Evaporated substance 13 is placed into crucible 1. Created in chamber 10 is vacuum. Whenever required, complex compounds of initial substance are dissociated into components by raising the temperature of former 3 with the help of thermal tubes 8 and their heater 9. EFFECT: higher efficiency. 3 cl, 1 dwg