CHARGED PARTICLES SOURCE Russian patent published in 1995 - IPC

Abstract SU 1734510 A4

FIELD: gas-discharge process devices. SUBSTANCE: hollow cathode of charged-particles source is installed in auxiliary chamber. Disk mounted on end of cathode surface facing anode forms, together with cathode, annular slit. Slit area is two orders of magnitude smaller than that of auxiliary chamber internal surface. Chamber accommodates additional disks forming, together with cathode holder, annular slits. Area of each slit is greater than 1) of area of part of chamber internal surface between adjacent additional disks. This enables heating of active material in hollow cathode to temperature required for exciting arc discharge. Auxiliary chamber can be provided with contracting hole communicating with anode through limiting resistor is placed between cathode and anode. EFFECT: improved stability of arc discharge excitation. 2 cl, 1 dwg

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SU 1 734 510 A4

Authors

Nikitinskij V.A.

Dates

1995-03-27—Published

1990-10-31—Filed