CHARGED PARTICLES SOURCE Russian patent published in 1995 - IPC

Abstract SU 1568793 A1

FIELD: gas-discharge process plants. SUBSTANCE: source has hollow cathode 1 with emission channel 2. Auxiliary chamber 4 has disk 6 forming annular slit together with cathode 1. Auxiliary glow discharge is fired between anode 8 and chamber 4. After cathode 1 is heated by this discharge, the latter is carried over to cathode. EFFECT: simplified power supply system. 1 dwg

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SU 1 568 793 A1

Authors

Nikitinskij V.A.

Ob"Edkov S.I.

Stognij A.I.

Bogatyrev O.A.

Dates

1995-03-27—Published

1988-09-20—Filed