PROCESS OF FORMATION OF NANOSTRUCTURE Russian patent published in 1994 - IPC

Abstract RU 2007783 C1

FIELD: microelectronics. SUBSTANCE: process of formation of nanostructure consists in passing of monatomic beam through two-dimensional standing light wave created with laser. Monatomic beam is distributed at input into light wave over area (π/2)2 which center is nodal line. With movement in standing wave beam compresses with radiation force to nodal line to sizes of ionometers. To produce effect of compression direction of movement of atoms should coincide with direction of nodal lines of light wave with high degree of accuracy. Length of light wave is chosen close to frequency of radiation transition of atom. Intensity of light wave is chosen close to frequency of radiation transition of atom. EFFECT: improved stability of nanostructure. 1 dwg

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RU 2 007 783 C1

Authors

Ovchinnikov Boris Mikhajlovich

Ovchinnikov Jurij Borisovich

Dates

1994-02-15Published

1991-10-02Filed