FIELD: physics.
SUBSTANCE: photolithographic interference method includes generating three coherent light beams and obtaining a two-dimensional periodic interference pattern thereof; the first two coherent beams are generated in the same plane of incidence and the third beam is generated in a plane perpendicular to the first; the first two beams have the same intensity and the third beam has intensity double that of the first beam.
EFFECT: obtaining non-defective nanosized two-dimensional periodic structures.
5 cl, 4 dwg
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