LIQUID ETCHANT FOR NEGATIVE-ACTING PHOTORESIST ETCHING OF CHALCOGENIDE GLASS Russian patent published in 1994 - IPC

Abstract RU 2008285 C1

FIELD: manufacture of materials for optical recording. SUBSTANCE: etchant includes the following components, % by weight: dimethyl ketone 70-98.4 and base for the balance. For etching As₂S₃ glass ammonium hydroxide is used as the base in the amount of 1.6-2.8 % by weight, and ethylenediamine is employed in the amount of 5-30 % by weight for etching As₄₀S_60-xSe_x glass, where x = 20-40. EFFECT: increased efficiency. 2 cl, 2 tbl

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RU 2 008 285 C1

Authors

Indutnyj I.Z.

Kostjukevich S.A.

Shepeljavyj P.E.

Dates

1994-02-28—Published

1991-06-20—Filed