ION SOURCE Russian patent published in 1994 - IPC

FIELD: electron devices. SUBSTANCE: ion source is manufactured in the form of single-potential unit composed of discharge chamber with extraction slit 2, directly heated cathode 3 soldered to graphite backing 4, with graphite holders 5 and current leads 6 and electrode-reflector 7. Use of cathode with developed working surface makes it possible to generate high concentration of plasma close to extraction slit. Use of anode considerably increases concentration of plasma thanks to formation of flow of charged particles of all types contained in plasma directed to extraction slit transverse to lines of force of external magnetic field B without disturbance of quasi-neutrality of plasma. Given effect is obtained thanks to formation of electron Hall current in E x B fields. Use of cathodes and electrodes-reflectors made from carbides, nitrides and borides of zirconium more resistant to ion bombardment and chemical erosion than wolfram makes it possible to raise several times service life of ion source especially during operation under conditions of low-voltage discharge. EFFECT: improved efficiency and prolonged service life of ion source. 3 cl, 5 dwg