ION SOURCE Russian patent published in 1994 - IPC

Abstract SU 1762678 A1

FIELD: ion implantation; electromagnetic isotope separation. SUBSTANCE: directly heated cathode is mounted in a gas discharge chamber of an ion source having longitudinal magnetic field. The cathode is made as an axially symmetrical geometric figure. The cathode typical dimensions exceed at least two-fold the emission slit width. The plane on the discharge chamber side, in which the ion extraction aperture lays, crosses working surfaces of the cathode and a reflector electrode. The ion sputtering ratio of cathode and reflector electrode materials is larger than those of tungsten. EFFECT: enlarged operating capabilities. 1 dwg

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SU 1 762 678 A1

Authors

Makov B.N.

Jartsev D.I.

Dates

1994-05-15—Published

1990-09-25—Filed