METHOD AND DEVICE FOR PRODUCING ION BEAM Russian patent published in 1997 - IPC

FIELD: ion engineering. SUBSTANCE: additional electrode having smaller effective surface than discharge chamber walls is placed in discharge plasma and positive to discharge chamber potential is applied to it thereby concentrating full discharge current on its effective surface and increasing plasma concentration and electron temperature. Drift flow of all charged particles of plasma simultaneously formed in this space in crossed ExB fields is to extraction slit across magnetic field lines of force along stationary double electric layer formed in plasma without disturbing its quasi-neutrality and causing higher concentration of plasma at slit and current density in accelerated ion beam at same discharge conditions. EFFECT: increased current intensity in accelerated ion beam at same power in gas discharge. 11 cl, 14 dwg