METHOD FOR GENERATION OF MULTIPLE-COMPONENT ION BEAM Russian patent published in 1994 - IPC

Abstract RU 2009569 C1

FIELD: electric engineering. SUBSTANCE: elements of target to be sputtered are made of chemical compounds that are incompatible in solid phase. Ratio of areas of sputtered materials is inversely proportional to their sputter coefficients and directly proportional to desired percent content of ions of each chemical compound in ion beam. Elements of target to be sputtered are placed about focused gas ion beam so that molecular mass of chemical compounds which are in elements is increased in the direction of acceleration of multiple-component ion beam. EFFECT: increased functional capabilities. 1 dwg

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RU 2 009 569 C1

Authors

Venediktov A.N.

Zjuzin A.V.

Muranov E.N.

Filin I.A.

Dates

1994-03-15—Published

1991-08-28—Filed