FIELD: semiconductor metallurgy. SUBSTANCE: the starting germanium material is melted. Thereafter, (3-5)·10-4 % by weight of neodymium dopant is added to the molten metal, and germanium single crystal is drawn from the melt to the seeding step. EFFECT: provides increase in lifetime of minority carriers and decrease in majority-to-minority carrier lifetime.
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF MAKING SILICON CRYSTALS | 2011 |
|
RU2473719C1 |
| 0 |
|
SU1564203A1 | |
| GROWING OF GERMANIUM CRYSTALS | 2014 |
|
RU2563484C1 |
| METHOD OF PREPARING SILICON CRYSTALS WITH CYCLIC TWIN STRUCTURE | 2002 |
|
RU2208068C1 |
| METHOD OF PRODUCING SINGLE CRYSTALS OF INDIUM ANTIMONIDE | 0 |
|
SU1756392A1 |
| METHOD OF CLEANING MELT SURFACE WHEN GROWING GERMANIUM MONOCRYSTALS | 2017 |
|
RU2641760C1 |
| METHOD FOR PR0DUCTION OF ALLOYED MONOCRYSTALS OR POLYCRYSTALS OF SILICON | 2003 |
|
RU2250275C2 |
| METHOD OF PREPARING VOLUME SILICON MONOCRYSTALS OF P-TYPE | 1992 |
|
RU2070233C1 |
| MONOCRYSTALLINE SILICON OBTAINING METHOD | 1995 |
|
RU2057211C1 |
| METHOD FOR GROWING GERMANIUM MONOCRYSTALS | 2016 |
|
RU2626359C1 |
Authors
Dates
1994-06-15—Published
1991-04-22—Filed