FIELD: production of semiconductor materials. SUBSTANCE: method involves melting basic silicon in crucible; introducing seed; drawing crystal from melt onto rotating seed. The process is conducted in argon atmosphere, with argon consumption , upon introduction of seed, being determined by formula recited in Specification. EFFECT: increased efficiency, simplified method and improved quality of product. 2 cl, 1 tbl 1
| Title | Year | Author | Number | 
|---|---|---|---|
| METHOD OF PRODUCTION OF THE SINGLE-CRYSTAL SILICON (VERSIONS) | 2005 | 
 | RU2278912C1 | 
| METHOD OF PRODUCTION OF MONOCRYSTALLINE SILICON | 1999 | 
 | RU2193079C1 | 
| METHOD OF GROWING SILICON MONOCRYSTALS | 1995 | 
 | RU2076909C1 | 
| SILICON MONOCRYSTAL PRODUCTION METHOD | 1992 | 
 | RU2042749C1 | 
| METHOD FOR GROWING SILICON SINGLE CRYSTALS | 1995 | 
 | RU2077615C1 | 
| METHOD OF PREPARING SILICON MONOCRYSTALS INVOLVING MONOCRYSTAL GROWTH DISRUPTION | 2000 | 
 | RU2189407C2 | 
| SILICON MONOCRYSTAL GROWING APPARATUS, SCREENING DEVICE AND CRYSTAL GROWING PROCESS BY CHOKHRALSKY METHOD | 2002 | 
 | RU2231582C1 | 
| METHOD OF GROWING MONOCRYSTALS FROM MELT | 2000 | 
 | RU2200775C2 | 
| DEVICE FOR SILICON SINGLE CRYSTALS GROWING BY CHOKHRALSKY METHOD | 2007 | 
 | RU2355834C1 | 
| DEVICE FOR GROWING OF SINGLE CRYSTALS OF SILICON BY CZOCHRALSKI METHOD | 2008 | 
 | RU2382121C1 | 
Authors
Dates
1996-03-27—Published
1995-01-17—Filed