MAGAZINE FOR GROUP DIFFUSION TREATMENT Russian patent published in 1994 - IPC

Abstract RU 2018190 C1

FIELD: microelectronics. SUBSTANCE: magazine for group diffusion treatment of semiconductor plates has base on which inner surface ribs with slots to position plates are arranged longitudinally. Slots in ribs go as far as base of magazine. Base has recessions made under slots. Their sizes along and sidewise to rib are not less than corresponding sizes of slot at point of joining of rib with base of magazine. EFFECT: improved design, enhanced efficiency of diffusion treatment. 3 dwg

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RU 2 018 190 C1

Authors

Kondrashov V.V.

Murzin S.A.

Zagrjadskij S.V.

Dates

1994-08-15—Published

1992-04-15—Filed