HOLDER FOR GROUP DIFFUSION TREATMENT OF SEMICONDUCTOR PLATES Russian patent published in 2011 - IPC H01L21/22 

FIELD: physics.

SUBSTANCE: holder for group diffusion treatment of semiconductor plates is made from three polysilicon rods, two lateral rods are placed on the sides of plates being treated in the holder, and one bottom rod, which acts as the bottom of the holder, is placed below the plates being treated in the holder. The lateral rods are placed such that their longitudinal axes and centres of plates being treated in the holder lie in one plane. Grooves in the rods are merged to ensure that the treated plates lie in the vertical plane, perpendicular the longitudinal axes of the rods. Grooves in both lateral rods have a flat-topped cross section. The width of the lateral grooves is greater than thickness of the treated plates by 50-90%. The depth of the lateral grooves is equal to 2-4.5 times the width of the lateral grooves. Grooves in the bottom rod for holding the treated plates have a semicircle in the cross section with radius equal to 0.8-1.1 times the thickness of the treated plates.

EFFECT: invention avoids loss of plates during diffusion thermal treatment by avoiding sticking of plates in the grooves with reliable fixation of said plates in the lateral rods at the same time.