FIELD: electronics. SUBSTANCE: after first lamination is cut from ingot disturbed layer is removed from it with mechanical and chemical polishing on both sides. Direction with maximum hardness is found on side formed with second cut by scratching along crystallographic directions. Lateral feed of ingot to disc is performed then along this direction. For determination of hardness scratching is conducted with velocity equal to that of feed of ingot to disc. EFFECT: facilitated process of manufacture of semiconductor substrate. 2 cl, 3 tbl
Title | Year | Author | Number |
---|---|---|---|
METHOD OF CUTTING MONOCRYSTALLINE INGOTS OF SEMICONDUCTORS INTO PLATES | 0 |
|
SU1622141A1 |
PROCESS OF PREPARATION OF SURFACE OF SILICON PLATE | 1993 |
|
RU2065640C1 |
PROCESS OF PREPARATION OF SILICON SUBSTRATES | 1996 |
|
RU2110115C1 |
PROCESS FORMING MEMBRANES IN MONOCRYSTALLINE SILICON SUBSTRATE | 1995 |
|
RU2099813C1 |
METHOD OF CUTTING MONOCRYSTAL INGOTS | 0 |
|
SU1314401A1 |
METHOD FOR TREATMENT OF SINGLE-CRYSTALLINE SILICON PLATES | 1996 |
|
RU2119693C1 |
METHOD OF CUTTING MONOCRYSTALLINE SEMICONDUCTOR WAFERS | 0 |
|
SU823147A1 |
PROCEDURE DETERMINING DISORIENTATION ANGLE BETWEEN CRYSTALS | 1997 |
|
RU2139526C1 |
METHOD OF PRODUCING MONOCRYSTALLINE ARTICLES FROM REFRACTORY NICKEL ALLOYS WITH PRESET CRYSTAL-LATTICE ORIENTATION | 2012 |
|
RU2492025C1 |
METHOD FOR CHECKING STRUCTURE CHARACTERISTICS OF SINGLE-CRYSTALLINE SEMICONDUCTOR PLATES | 1998 |
|
RU2156520C2 |
Authors
Dates
1995-03-27—Published
1992-01-03—Filed