METHOD OF CONTROL OVER PLASMA FLUX AND PLASMA DEVICE Russian patent published in 1995 - IPC

FIELD: electronics. SUBSTANCE: each plasma jet forming plasma flux is exposed to action of magnetic field which component of vector of magnetic inductance is perpendicular to direction of outflow of corresponding jet to produce plasma flux with specified characteristics. Apart from magnetic field action may be implemented by change of energy invested in plasma flux, by change of rate of flow of plasma- forming gas in each of the jets or by change of its composition. As a result there appears possibility of control, reproduction and keeping constant in time such parameters of plasma flux as distribution of brightness and temperature, distribution of spectral radiation coefficient of plasma and distribution of concentration of ions in plasma flux. Plasma device for implementation of method has two or more plasma torches coupled to source of power supply of plasma arc and to sources of plasma-forming gas. Each of torches is fitted with magnet in the form of open core with solenoid. Device is provided with unit of registration of parameters of plasma flux connected to processing unit which outputs are linked to source of power supply of magnets, source of plasma-forming gas and source of power supply of plasma arc. EFFECT: enhanced efficiency of plasma working of surfaces. 15 cl, 9 dwg