SEMICONDUCTOR RESISTANCE STRAIN GAGE Russian patent published in 1995 - IPC

Abstract RU 2043671 C1

FIELD: measurement technology. SUBSTANCE: semiconductor resistance strain gage has substrate made of semi-insulating gallium arsenide in the form of rectangular plate and germanium strain-sensing film, 5·10-6 m thick. Substrate width is not more than twice as great as its thickness. EFFECT: improved accuracy of elastic strain measurement.

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RU 2 043 671 C1

Authors

Gorbachuk Nikolaj Tikhonovich[Ua]

Dates

1995-09-10Published

1990-10-15Filed