SEMICONDUCTOR RESISTOR Russian patent published in 2009 - IPC H01L29/84 

Abstract RU 2367062 C1

FIELD: physics; conductors.

SUBSTANCE: invention relates to the technology of semiconductor devices, particularly to making thermo- and tensoresistors, based on strain-sensitive semiconductor materials. According to the invention, the semiconductor resistor comprises an insulation layer on a substrate, a semiconductor layer in form of a 0.1-1.0 mcm thick band on the insulating layer, which has contacts at its ends, made in form of a metal layer, lying on part of the surface of the semiconductor layer and the insulating layer. The contacts are three-layered. The first layer, which lies on part of the surface of the semiconductor and the insulating layer, is made from aluminium. The middle layer is made from an alloy of aluminium with nickel or cobalt. The outer layer is made from nickel or cobalt.

EFFECT: increased sensitivity, reduced measurement errors, lower level of intrinsic noise of the semiconductor resistor, stability of electrical parametres and increased resistance to effect of aggressive media.

7 cl, 2 dwg

Similar patents RU2367062C1

Title Year Author Number
HIGH-VOLTAGE STRAIN SENSOR 2008
  • Lobtsov Viktor Aleksandrovich
  • Shchepikhin Aleksandr Ivanovich
RU2367061C1
SEMICONDUCTOR RESISTOR 2016
  • Lobtsov Viktor Aleksandrovich
  • Shchepikhin Aleksandr Ivanovich
  • Novojdarskaya Natalya Usmanovna
  • Komissarov Aleksandr Feliksovich
RU2655698C1
SEMICONDUCTOR RESISTOR 2016
  • Lobtsov Viktor Aleksandrovich
  • Shchepikhin Aleksandr Ivanovich
  • Novojdarskaya Natalya Usmanovna
  • Komissarov Aleksandr Feliksovich
RU2646545C1
MECHANICAL QUANTITIES MEASURING DEVICE (VERSIONS) AND METHOD OF ITS PRODUCTION 2007
  • Volodin Nikolaj Mikhajlovich
RU2346250C1
METAL-SEMICONDUCTOR-METAL (MSM) HETEROJUNCTION DIODE 2013
  • Khussin Rozana
  • Chen Isyuan
  • Lo I
RU2632256C2
SEMICONDUCTOR OXYGEN SENSOR 2013
  • Kaminskij Vladimir Vasil'Evich
  • Kazakov Sergej Aleksandrovich
RU2546849C2
METHOD FOR PRODUCING RESISTIVE CONTACTS ON PLANAR SIDE OF STRUCTURE WITH LOCAL REGIONS OF LOW-ALLOYED SEMICONDUCTORS 1993
  • Mineeva M.A.
  • Murakaeva G.A.
RU2084988C1
BOUNDED SEMICONDUCTOR STRAIN GAUGE 2011
  • Volodin Nikolaj Mikhajlovich
  • Kaminskij Vladimir Vasil'Evich
  • Mishin Jurij Nikolaevich
  • Pavlinova Elena Evgen'Evna
RU2463686C1
METHOD FOR PRODUCING INJECTING CONTACT TO SAMARIUM MONOSULFIDE 1995
  • Volodin N.M.
  • Kostjukevich E.V.
  • Smertenko P.S.
  • Khanova A.V.
  • Khanov Ju.A.
RU2089972C1
METHOD FOR FORMATION OF MULTILAYER OHMIC CONTACT TO GALLIUM ARSENIDE-BASED DEVICE 2014
  • Andreev Vyacheslav Mikhaylovich
  • Soldatenkov Fedor Jur'Evich
  • Usikova Anna Aleksandrovna
RU2575977C1

RU 2 367 062 C1

Authors

Lobtsov Viktor Aleksandrovich

Shchepikhin Aleksandr Ivanovich

Dates

2009-09-10Published

2008-05-15Filed