FIELD: physics; conductors.
SUBSTANCE: invention relates to the technology of semiconductor devices, particularly to making thermo- and tensoresistors, based on strain-sensitive semiconductor materials. According to the invention, the semiconductor resistor comprises an insulation layer on a substrate, a semiconductor layer in form of a 0.1-1.0 mcm thick band on the insulating layer, which has contacts at its ends, made in form of a metal layer, lying on part of the surface of the semiconductor layer and the insulating layer. The contacts are three-layered. The first layer, which lies on part of the surface of the semiconductor and the insulating layer, is made from aluminium. The middle layer is made from an alloy of aluminium with nickel or cobalt. The outer layer is made from nickel or cobalt.
EFFECT: increased sensitivity, reduced measurement errors, lower level of intrinsic noise of the semiconductor resistor, stability of electrical parametres and increased resistance to effect of aggressive media.
7 cl, 2 dwg
Title | Year | Author | Number |
---|---|---|---|
HIGH-VOLTAGE STRAIN SENSOR | 2008 |
|
RU2367061C1 |
SEMICONDUCTOR RESISTOR | 2016 |
|
RU2655698C1 |
SEMICONDUCTOR RESISTOR | 2016 |
|
RU2646545C1 |
MECHANICAL QUANTITIES MEASURING DEVICE (VERSIONS) AND METHOD OF ITS PRODUCTION | 2007 |
|
RU2346250C1 |
METAL-SEMICONDUCTOR-METAL (MSM) HETEROJUNCTION DIODE | 2013 |
|
RU2632256C2 |
SEMICONDUCTOR OXYGEN SENSOR | 2013 |
|
RU2546849C2 |
METHOD FOR PRODUCING RESISTIVE CONTACTS ON PLANAR SIDE OF STRUCTURE WITH LOCAL REGIONS OF LOW-ALLOYED SEMICONDUCTORS | 1993 |
|
RU2084988C1 |
BOUNDED SEMICONDUCTOR STRAIN GAUGE | 2011 |
|
RU2463686C1 |
METHOD FOR PRODUCING INJECTING CONTACT TO SAMARIUM MONOSULFIDE | 1995 |
|
RU2089972C1 |
METHOD FOR FORMATION OF MULTILAYER OHMIC CONTACT TO GALLIUM ARSENIDE-BASED DEVICE | 2014 |
|
RU2575977C1 |
Authors
Dates
2009-09-10—Published
2008-05-15—Filed