FIELD: production of semiconductor photo transducers. SUBSTANCE: method involves positioning silicon plates in plane 100, heating it in etching reagent that contains caustic alkali, surface active substance and water. Surface active substance concentration Csas and caustic alkali concentration Cal conform to equation , where G is surface activity of surface active substance in erg cm/gram-molecule, S is total area of plates under processing in cm2; K is experimental factor which equals to 10-60 erg/cm gram-molecule; Cal=52.5 gram-molecule/l. During processing plates are in vertical position and are spaced from one another by d=k1•Cal+k2,, where K1 K2 are experimental coefficients, which equal to 0.07-0.11 cm l/gram-molecule and 0.02-0.05 cm correspondingly. EFFECT: increased albedo of processed plates, increased reproducibility of manufacturing. 1 tbl
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Authors
Dates
1996-03-20—Published
1993-06-08—Filed