FIELD: microelectronics. SUBSTANCE: detector has silicon substrate with source and drain areas. There is a layer of thin dielectric between the areas. Gate is disposed onto the layer. Holes are made into thick dielectric layer for making contacts with source and drain areas. There is a polysilicon film onto the thin dielectric layer between gate and thick dielectric layer. Silicon dioxide layer is deposited onto the thin dielectric layer. The film is made in form of a loop or a frame. Width of the film does not excess distance of boundary of the thick dielectric layer to boundary of spatial charge area of drain and source. The gate is made of catalytically active metal. EFFECT: improved reliability of operation. 2 dwg
Title | Year | Author | Number |
---|---|---|---|
GAS-SENSITIVE SENSOR BASED ON FIELD-EFFECT TRANSISTOR AND PROCESS OF DETERMINATION OF CONCENTRATION OF GASES | 1998 |
|
RU2169363C2 |
INTEGRATED CIRCUIT WITH TWO TYPES OF TRANSISTORS | 1994 |
|
RU2100874C1 |
TWO-GATE MIS STRUCTURE WITH VERTICAL CHANNEL | 1995 |
|
RU2106721C1 |
METHOD OF MANUFACTURE OF INTEGRATED CIRCUITS BASED ON MOSFET TRANSISTORS | 1994 |
|
RU2100873C1 |
MANUFACTURING METHOD OF SHF LDMOS TRANSISTORS | 2010 |
|
RU2439744C1 |
FIELD-EFFECT SCHOTTKY TRANSISTOR | 1991 |
|
RU2025831C1 |
STORAGE CELL FOR DYNAMIC MAIN STORAGE | 1991 |
|
RU2029995C1 |
PROCESS OF MANUFACTURE OF MIS TRANSISTORS OF INTEGRATED MICROCIRCUITS | 0 |
|
SU1322929A1 |
0 |
|
SU1785049A1 | |
METHOD OF MAKING MICROWAVE LDMOS-TRANSISTOR CRYSTALS WITH MULTILAYER DRIFT DRAIN REGION | 2024 |
|
RU2819581C1 |
Authors
Dates
1996-05-27—Published
1993-02-15—Filed