FIELD: manufacture of membrane sieves. SUBSTANCE: method for manufacture of membrane sieves includes operations of local irradiation of film or plate with fluxes of high-energy particles (quanta of radiation, electrons or ions) and subsequent etching. Film or plate is coated before irradiation with resist in form of spaced islands, and after irradiation, it is treated with etching agent to form holes in resist but not affecting the film or plate. The system is subjected to shrinking, and through pores are etched in the film with etching agent which does not affect the resist. Shrinking may be accomplished before etching the resist, and film or plate, before etching may be additionally irradiated with fluxes of high-energy particles through holes in the resist. EFFECT: higher efficiency. 5 cl, 1 dwg
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Authors
Dates
1996-06-10—Published
1992-09-28—Filed