FIELD: manufacture of filtering membranes. SUBSTANCE: method for manufacture of membranes for filtration includes operations involved in local irradiation of film or plate with beams of high-energy particles (quanta of radiation, electrodes or ions) and subsequent etching. Prior to irradiation, the film or plate is stretched and a layer of flexible resist is applied. Flexible resist is used in form of Langmuir film. Through holes are etched in the irradiated resist, stress is removed and through channels (pores) are etched in substrate through formed holes. The sequence of stress removal and resist etching may be reversed. Prior to etching the substrate, it may be subjected to additional irradiation through the holes in resist. Substrate may be used in form of film with pores formed preliminarily. After removal of stress from the film the sizes of pores and distance between them prove to be smaller than the zones of irradiation and spaces from one another. EFFECT: higher efficiency. 8 cl, 1 dwg
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Authors
Dates
1996-06-10—Published
1992-09-28—Filed