METHOD OF MANUFACTURE OF POROUS DIAPHRAGMS Russian patent published in 1998 - IPC

FIELD: mechanical engineering. SUBSTANCE: the method consists in local radiation treatment of the initial film by flows of high-energy particles (quanta of radiation, electrons or ions) and subsequent etching. Prior to radiation treatment, the film is coated with resist in the form of spatially separated islands and tensioned. After radiation treatment the tensile stresses are removed, etching is performed in two stages, in the first stage - by means of etching agent that etches holes in the resist and does not influence the initial film, and in the second stage - by means of etching agent that etches holes in the initial film through the holes in the resist layer and does not influence the latter. Resist coating may be obtained by application of a continuous layer of resist onto the initial film, its dissection into islands by action of a flow of high-energy particles and subsequent etching by etching agent; which does not influence the initial film, but etches grooves on the boundaries of the islands, prior to radiation treatment of the initial film, it is additionally tensioned. EFFECT: facilitated procedure. 8 cl, 4 dwg