FIELD: plasma procedures, thin-film coverages. SUBSTANCE: coverages are applied by means of a newly designed magnetron using an accelerator with closed electron drift for the purification of a surface and so called ionic support when applying the coverages. EFFECT: obtained high- quality coverages on the basis of nitrides, oxides, and pure materials on articles having various shape and composition. 4 cl, 4 dwg
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Authors
Dates
1996-07-27—Published
1993-03-01—Filed