FIELD: optical instrument engineering. SUBSTANCE: method is based upon clearing substrate by inert gas ions and applying coating at simultaneous bombardment of substrate by ion beam. Ion beam is produced in accelerator with closed drift. Ion beam is directed onto the substrate at 15-45 deg angle to surface to meet moving substrate at pressure of (1,3-5,3)x10-2 Pa and energy of ions of 50-150 eV. Coating is applied prior to finishing clearing. Vacuum installation has at least two accelerators with closed drift and applied metal plasma generator made in form of tubular cathode and spiral-shaped anode embracing the cathode. EFFECT: improved efficiency. 3 cl, 3 dwg
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